Within the framework of the recent changes to the Chinese Patent Law and its Implementing Regulations, the State Intellectual Property Office of China (SIPO) has released two more draft documents for public opinion:
The Draft Amendments to the Measures on Compulsory Patent Licensing specify, inter alia, the conditions under which compulsory licenses may be granted or terminated, and provide detailed rules for the procedures at SIPO and for the calculation of licensing fees. The public may submit comments until 13 November 2011 (draft available in Chinese only).
The Draft Provisions on the Methods for Labelling Patent Markings include a relaxation of number formats accepted as markings, counter-measures against false marking and regulations for markings as "patent pending". The draft is available for comments until 22 November 2011 (in Chinese only).