T 0409/01 of 26.06.2003
- European Case Law Identifier
- ECLI:EP:BA:2003:T040901.20030626
- Date of decision
- 26 June 2003
- Case number
- T 0409/01
- Online on
- 21 July 2003
- Petition for review of
- -
- Application number
- 94118479.8
- IPC class
- H01L 21/316
- Language of proceedings
- English
- Distribution
- Distributed to board chairmen (C)
- Download
- Decision in English
- OJ versions
- No OJ links found
- Other decisions for this case
- -
- Abstracts for this decision
- -
- Application title
- A method of forming silicon oxy-nitride films by plasma- enhanced chemical vapor deposition
- Applicant name
- APPLIED MATERIALS, Inc.
- Opponent name
- -
- Board
- 3.4.03
- Headnote
- -
- Relevant legal provisions
- European Patent Convention Art 56 1973
- Keywords
- Inventive step (yes, after amendments)
- Catchword
- -
- Cited cases
- -
- Citing cases
- -
ORDER
For these reasons it is decided that:
1. The decision under appeal is set aside.
2. The case is remitted to the first instance with the order to grant a patent on the basis of the following patent application documents:
Description:
Pages 1, 2, 8 and 9 as filed;
Pages 3, 3a, 4 to 7, 10 and 11 filed with the letter dated 11 May 1999;
Pages 12 and 13 annexed to the communication of the Board of 20 February 2003 and agreed by the appellant by the letter dated 17 April 2003;
Claims:
No. 1 annexed to the communication of the Board of 20 February 2003 and agreed by the appellant by the letter dated 17 April 2003;
Nos. 2 to 4 of the then first auxiliary request filed with the letter dated 5 October 2000;
Drawings:
Sheet 1/1 as filed.