T 0610/89 of 18.09.1991
- European Case Law Identifier
- ECLI:EP:BA:1991:T061089.19910918
- Date of decision
- 18 September 1991
- Case number
- T 0610/89
- Online on
- 4 November 1991
- Petition for review of
- -
- Application number
- 82201230.8
- IPC class
- H01L 21/27
- Language of proceedings
- English
- Distribution
- No distribution (D)
- Download
- Decision in English
- OJ versions
- No OJ links found
- Other decisions for this case
- -
- Abstracts for this decision
- -
- Application title
- Process for producing a semiconductor device having an insulating layer of silicon dioxide covered by a film of silicon oxynitride
- Applicant name
- Fujitsu Ltd
- Opponent name
- Siemens AG
- Board
- 3.4.01
- Headnote
- -
- Relevant legal provisions
- European Patent Convention Art 56 1973
- Keywords
- Inventive step (no)
Interpretation of the prior art in view of common
general knowledge at the filing date - Catchword
- -
- Cited cases
- -
- Citing cases
- -
ORDER
For these reasons, it is decided that:
The appeal is dismissed.