T 0329/89 of 13.09.1990
- European Case Law Identifier
- ECLI:EP:BA:1990:T032989.19900913
- Date of decision
- 13 September 1990
- Case number
- T 0329/89
- Petition for review of
- -
- Application number
- 79301114.9
- IPC class
- H01L 21/318
- Language of proceedings
- English
- Distribution
- No distribution (D)
- Download
- Decision in English
- OJ versions
- No OJ links found
- Other decisions for this case
- -
- Abstracts for this decision
- -
- Application title
- Process for producing a semiconductor device having an insulating layer of silicon dioxide covered by a film of silicon oxynitride
- Applicant name
- Fujitsu Limited
- Opponent name
- Siemens AG
- Board
- 3.4.01
- Headnote
- -
- Relevant legal provisions
- European Patent Convention Art 56 1973
- Keywords
- Inventive step
- Catchword
- -
ORDER
For these reasons, it is decided that:
1. The decision under appeal is set aside.
2. Appellant's main and first to fourth auxiliary requests are rejected.
3. The case is remitted to the Opposition Division for further prosecution on the basis of Claims 1 to 5 filed during the oral proceedings as fifth auxiliary request.